Recent progress in low-temperature CVD growth of 2D materials
نویسندگان
چکیده
Abstract Two-dimensional (2D) materials have emerged as a promising class of with unique physical and chemical properties that offer exciting prospects for various applications. Among all the synthesis methods, vapor deposition (CVD) techniques demonstrated great advantages in large-scale production 2D controlled thickness. One main challenges growth is need high temperatures crystalline substrates, which restrict scalability compatibility existing manufacturing processes, due to thermal budget necessity transfer films secondary substrates. Low-temperature methods potential overcome this challenge enable integration into wide range devices In recent years, there been substantial efforts develop low-temperature different materials, including graphene, hexagonal boron nitride (h-BN), transition metal dichalcogenides (TMDs). These include CVD, plasma-enhanced CVD (PECVD), atomic layer (ALD), metal-organic (MOCVD). This review not only discusses progress but also highlights applications low-temperature-grown fields, such field effect transistors (FET), sensors, photodetectors, catalysts, batteries, supercapacitors.
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ژورنال
عنوان ژورنال: Oxford open materials science
سال: 2023
ISSN: ['2633-6979']
DOI: https://doi.org/10.1093/oxfmat/itad010